Endpoint detection for photoresist ashing and stripping
Endpoint detection technology refers to evaluating the change of plasma emission from one or several specific wavelengths to gauge the progress of the plasma etching … Read More
Endpoint detection technology refers to evaluating the change of plasma emission from one or several specific wavelengths to gauge the progress of the plasma etching … Read More
More power high speed. Su-8 photoresist layer can range from several microns to hundreds to microns. To increase the ashing speed for the thick photoresist … Read More
Website update We finally get the website updated. New website is more streamline to provide better customer experience. We will also provide more frequent news … Read More