What is plasma cleaning

Plasma cleaning is the process of creating energetic plasma to remove nanometer-scale impurities and contaminants from surfaces. The cleaning process can be achieved through chemical reactions with radical oxygen, hydrogen, fluorine, or chlorine species or through energetic ion sputtering by heavy ions, such as argon ions. Plasma cleaner is the equipment to generate chemically reactive radicals and energetic ions through the plasma discharge processes. Plasma can be generated through rf, microwave, or DC glow discharge.

Principle of plasma cleaning and plasma cleaner
Principle of plasma cleaning